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Publication

24

Deposition velocity onto an inverted flat surface in a laminar parallel flow

Aerosol Science and Technology 44(11): 919-929

23

Particle deposition velocity onto a face-up flat surface in a laminar parallel flow considering Brownian diffusion and gravitational settling

Journal of Aerosol Science 41(10): 911-920

22

Particle deposition velocity onto a wafer or a photomask in a laminar parallel flow

Journal of the Electrochemical Society 157(6): H692-H698

21

Natural convection around a radial heat sink

International Journal of Heat and Mass Transfer 53(13-14): 2935-2938

20

Film flow around a fast rotating roller

International Journal of Heat and Fluid Flow 30(4): 796-803

19

Nanoparticle contamination control for EUVL-technology: especially for photomasks in carriers and scanners

Proceedings of SPIE 7364: 73640N

18

Gaussian diffusion sphere model to predict mass transfer due to diffusional particle deposition on a flat surface in laminar flow regime

Applied Physics Letters 94: 191909

17

Frost behavior on a fin considering the heat conduction of heat exchanger fins

International Journal of Heat and Mass Transfer 52(11-12): 2581-2588

16

Classification of highly monodisperse nanoparticles of NIST-traceable sizes by TDMA and control of deposition spot size on a surface by electrophoresis

Journal of Aerosol Science 39: 537-548

15

Controlled deposition of SiO2 nanoparticles of NIST-traceable particle sizes for mask surface inspection system characterization

IEEE Transactions on Semiconductor Manufacturing 21(2): 238-243

14

Controlled deposition of NIST-traceable nanoparticles as additional size standards for photomask applications

Proceedings of SPIE 6922: 69220G

13

Experimental investigations on particle contamination of masks without protective pellicles during vibration or shipping of mask carriers

IEEE Transactions on Semiconductor Manufacturing 20(4): 578-584

12

Experimental investigations of protection schemes for extreme ultraviolet lithography masks in carrier systems against horizontal aerosol flow

IEEE Transactions on Semiconductor Manufacturing 20(2): 176-186

11

Numerical evaluation of protection schemes for EUVL masks in carrier systems against horizontal aerosol flow

Journal of the Electrochemical Society 154(3): H170-H176

10

Evaluation of protection schemes for extreme ultraviolet lithography (EUVL) masks against top-down aerosol flow

Journal of Aerosol Science 38: 211-227

9

Simple theoretic approach to estimate the effect of gravity and thermophoresis on the diffusional nanoparticle contamination under low pressure conditions

Journal of Vacuum Science & Technology B 25(1): 47-53

8

Concepts for protection of EUVL masks from particle contamination

Journal of Nanoparticle Research 8: 705-708

7

Effect of reverse flow by differential pressure on the protection of critical surfaces against particle contamination

Journal of Vacuum Science & Technology B 24(4): 1844-1849

6

Investigation of thermophoretic protection with speed-controlled particles at 100, 50, and 25 mTorr

Journal of Vacuum Science & Technology B 24(3): 1178-1184

5

Experimental study of nanoparticle penetration efficiency through coils of circular cross-sections

Aerosol Science and Technology 40: 456-462