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Publication

19

Nanoparticle contamination control for EUVL-technology: especially for photomasks in carriers and scanners

Proceedings of SPIE 7364: 73640N

Authors : H Fissan, C Asbach, TAJ Kuhlbusch, J Wang, DYH Pui, SJ Yook, JH Kim Year : 2009

18

Gaussian diffusion sphere model to predict mass transfer due to diffusional particle deposition on a flat surface in laminar flow regime

Applied Physics Letters 94: 191909

Authors : SJ Yook, KH Ahn Year : 2009

17

Frost behavior on a fin considering the heat conduction of heat exchanger fins

International Journal of Heat and Mass Transfer 52(11-12): 2581-2588

Authors : JS Kim, KS Lee, SJ Yook Year : 2009

16

Classification of highly monodisperse nanoparticles of NIST-traceable sizes by TDMA and control of deposition spot size on a surface by electrophoresis

Journal of Aerosol Science 39: 537-548

Authors : SJ Yook, H Fissan, T Engelke, C Asbach, T van der Zwaag, JH Kim, J Wang, DYH Pui Year : 2008

15

Controlled deposition of SiO2 nanoparticles of NIST-traceable particle sizes for mask surface inspection system characterization

IEEE Transactions on Semiconductor Manufacturing 21(2): 238-243

Authors : SJ Yook, H Fissan, T Engelke, C Asbach, T van der Zwaag, JH Kim, F Eschbach, J Wang, DYH Pui Year : 2008

14

Controlled deposition of NIST-traceable nanoparticles as additional size standards for photomask applications

Proceedings of SPIE 6922: 69220G

Authors : J Wang, DYH Pui, C Qi, SJ Yook, H Fissan, E Ultanir, T Liang Year : 2008

13

Experimental investigations on particle contamination of masks without protective pellicles during vibration or shipping of mask carriers

IEEE Transactions on Semiconductor Manufacturing 20(4): 578-584

Authors : SJ Yook, H Fissan, C Asbach, JH Kim, DD Dutcher, PY Yan, DYH Pui Year : 2007

12

Experimental investigations of protection schemes for extreme ultraviolet lithography masks in carrier systems against horizontal aerosol flow

IEEE Transactions on Semiconductor Manufacturing 20(2): 176-186

Authors : SJ Yook, H Fissan, C Asbach, JH Kim, T van der Zwaag, T Engelke, PY Yan, DYH Pui Year : 2007

11

Numerical evaluation of protection schemes for EUVL masks in carrier systems against horizontal aerosol flow

Journal of the Electrochemical Society 154(3): H170-H176

Authors : T Engelke, T van der Zwaag, C Asbach, H Fissan, JH Kim, SJ Yook, DYH Pui Year : 2007

10

Evaluation of protection schemes for extreme ultraviolet lithography (EUVL) masks against top-down aerosol flow

Journal of Aerosol Science 38: 211-227

Authors : SJ Yook, H Fissan, C Asbach, JH Kim, J Wang, PY Yan, DYH Pui Year : 2007

9

Simple theoretic approach to estimate the effect of gravity and thermophoresis on the diffusional nanoparticle contamination under low pressure conditions

Journal of Vacuum Science & Technology B 25(1): 47-53

Authors : C Asbach, H Fissan, JH Kim, SJ Yook, DYH Pui Year : 2007

8

Concepts for protection of EUVL masks from particle contamination

Journal of Nanoparticle Research 8: 705-708

Authors : C Asbach, H Fissan, JH Kim, SJ Yook, DYH Pui Year : 2006

7

Effect of reverse flow by differential pressure on the protection of critical surfaces against particle contamination

Journal of Vacuum Science & Technology B 24(4): 1844-1849

Authors : JH Kim, H Fissan, C Asbach, SJ Yook, J Wang, DYH Pui, KJ Orvek Year : 2006

6

Investigation of thermophoretic protection with speed-controlled particles at 100, 50, and 25 mTorr

Journal of Vacuum Science & Technology B 24(3): 1178-1184

Authors : JH Kim, H Fissan, C Asbach, SJ Yook, DYH Pui, K Orvek Year : 2006

5

Experimental study of nanoparticle penetration efficiency through coils of circular cross-sections

Aerosol Science and Technology 40: 456-462

Authors : SJ Yook, DYH Pui Year : 2006

4

Speed-controlled particle injection into a low-pressure system

Journal of Vacuum Science & Technology A 24(2): 229-234

Authors : JH Kim, H Fissan, C Asbach, SJ Yook, DYH Pui Year : 2006

3

Analytical modeling of particle stopping distance at low pressure to evaluate protection schemes for extreme ultraviolet lithography masks

Applied Physics Letters 87: 234111

Authors : C Asbach, JH Kim, SJ Yook, DYH Pui, H Fissan Year : 2005

2

Modeling of protection schemes for critical surfaces under low pressure conditions: comparison between analytical and numerical approach

Journal of Vacuum Science & Technology B 23(6): 2419-2426

Authors : C Asbach, DYH Pui, JH Kim, SJ Yook, H Fissan Year : 2005

1

Protection schemes for critical surface in vacuum environments

Journal of Vacuum Science & Technology A 23(5): 1319-1324

Authors : JH Kim, C Asbach, SJ Yook, H Fissan, K Orvek, A Ramamoorthy, PY Yan, DYH Pui Year : 2005